Diaphragm valve for the vacuum exhaustion system
US7416165B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Feb 9, 2004 |
| Grant date | Aug 26, 2008 |
| Priority date | — |
| Expiry date | Jun 9, 2024 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF16K51/02
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
A diaphragm valve 1 is provided with a body 2 having a flow-in passage 6, a flow-out passage 7, and a valve seat 8 formed between the passages; a diaphragm 3 installed in the body 2 and permitted to rest on and move away from the valve seat 8; and a driving means 4 installed on the body 2 to allow the diaphragm 3 to rest on and move away from the valve seat 8, wherein synthetic resin films 5 of predetermined thickness are coated on fluid-contacting parts 25 of the afore-mentioned body 2 and diaphragm 3. A diaphragm valve in accordance with the present invention prevents corrosion of the valve members caused by accumulation and adherence of substances produced by thermal decomposition, and prevents clogging caused by substances produced, and prevents seat leakage when applied in the vacuum exhaust system of a semiconductor manufacturing facility.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.