Lithographic apparatus and device manufacturing method
US7417711B2 · kind B2 · utility
4Cited by
7References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 6, 2006 |
| Grant date | Aug 26, 2008 |
| Priority date | — |
| Expiry date | Nov 6, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70766
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus in which a balance mass is supported by a base frame using at least one supporting member which is coupled to both the base frame and balance mass. Free horizontal movement is provided by providing the supporting member with at least two pivot points.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.