Method, device and software for the optical inspection of a semi-conductor substrate
US7417719B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 13, 2004 |
| Grant date | Aug 26, 2008 |
| Priority date | — |
| Expiry date | Mar 16, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The invention relates to a method and a device for the optical inspection of the surface of semi-conductor substrate. An image (1) is captured on the surface of the semi-conductor substrate which is covered with a thin layer. Said image is made of a plurality of pixels having associated colour values and intensities. The frequency distribution of pixels having equal colour co-ordination values is calculated (3,4,5) from the colour values in a colour range (2), said colour range having a colour intensity and colour co-ordinates. The thus calculated frequency distribution is used (7, 9) to compare a second correspondingly calculated frequency distribution or a variable derived therefrom. According to the invention, the colour shift (9) and/or differences (7) in the colour distribution are determined according to fluctuations in the intensity of the illumination. The invention also relates to a method and a device for producing a structured semi-conductor substrate by using the above-mentioned method or the above-mentioned device and software for carrying out said method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.