Exposure method and apparatus for immersion lithography
US7420188B2 · kind B2 · utility
2Cited by
3References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 14, 2005 |
| Grant date | Sep 2, 2008 |
| Priority date | — |
| Expiry date | Aug 17, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70941
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for immersion lithography includes providing a substrate coated with an imaging layer, dispensing a conductive immersion fluid between the substrate and an imaging lens of a lithography system, and performing an exposure process to the imaging layer using a radiation energy through the conductive immersion fluid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.