Immersion exposure technique
US7420651B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 8, 2007 |
| Grant date | Sep 2, 2008 |
| Priority date | — |
| Expiry date | Jun 8, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus which exposes a substrate to a pattern of an original via a projection optical system, with a gap between the projection optical system and the substrate being filled with liquid. The apparatus includes a substrate stage, movable with respect to the projection optical system, which holds the substrate, a plate, movable with respect to the projection optical system, having a substantially flush surface with an exposed surface of the substrate held by the substrate stage, and an immersion unit configured to supply and to recover the liquid. Supply and recovery by the immersion unit are simultaneously executed while the plate opposes the projection optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.