Lithographic apparatus and device manufacturing method
US7423720B2 · kind B2 · utility
13Cited by
18References
37Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 12, 2004 |
| Grant date | Sep 9, 2008 |
| Priority date | — |
| Expiry date | Jun 1, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70858
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.