Lithographic apparatus
US7423721B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 15, 2004 |
| Grant date | Sep 9, 2008 |
| Priority date | — |
| Expiry date | Sep 19, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70991
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A vacuum operated lithographic apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing includes a plurality of transport circuits for transporting fluids and/or electrical signals for use in a first process mode for lithographic processing. At least one of the transport circuits is adapted to transport energy towards the interior of the vacuum housing to stimulate outgassing in the vacuum housing for use in a second process mode for bringing the lithographic apparatus into a vacuum operating condition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.