Lithographic apparatus and device manufacturing method utilizing placement of a patterning device at a pupil plane
US7423732B2 · kind B2 · utility
5Cited by
23References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 2, 2005 |
| Grant date | Sep 9, 2008 |
| Priority date | — |
| Expiry date | Aug 15, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70283
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography system comprises an illumination system that supplies radiation and a projection system comprising an optical system and a patterning device located at a pupil plane. The patterning device patterns the radiation and the optical system projects the patterned radiation onto a target portion of a substrate. In one example, an additional patterning device is located at an object plane of the lithography system and patterns the radiation before the patterning device at the pupil plane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.