Patent · US Expired

Method and apparatus for producing extreme ultraviolet radiation or soft X-ray radiation

US7427766B2 · kind B2 · utility

17Cited by

1References

26Claims

0Family size

Assignee

KONINKLIJKE PHILIPS ELECTRONICS NV · NL

Inventors

Jeroen Jonkers · Seevetal, DE
Dominik Marcel Vaudrevange · Aachen, DE
Willi Neff · Kelmis, BE

Key dates

Filing date	Sep 1, 2004
Grant date	Sep 23, 2008
Priority date	—
Expiry date	May 5, 2025

Classification

Technology area (CPC H)Electricity
CPC primaryH05G2/0035
WIPO fieldMedical technology
WIPO sectorInstruments

Abstract

A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two electrodes (14, 16) in a discharge space (12), said plasma emitting said radiation that is to be produced. The gaseous medium is produced from a metal melt (24), which is applied to a surface in said discharge space (12) and at least partially evaporated by an energy beam, in particular by a laser beam (20).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.