Method for the production of a substrate
US7429543B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 6, 2006 |
| Grant date | Sep 30, 2008 |
| Priority date | — |
| Expiry date | Oct 27, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Method for producing a substrate includes establishing a plasma discharge with a locally inhomogeneous density distribution and exposing the substrate to the inhomogeneously density-distributed plasma discharge. The distribution is established by establishing a specified relative movement of the inhomogeneous density distribution and of the substrate and establishing a specified time variation of an electric power signal supplying the discharge and/or of an optionally provided further electric signal which connects the substrate to bias voltage. When the electric power signal or further electric signal is an AC signal, the specified time variation of the signal addresses its modulation and the method includes setting the variation and the movement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.