Systems and methods for detecting contaminants
US7430893B2 · kind B2 · utility
9Cited by
10References
38Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 1, 2004 |
| Grant date | Oct 7, 2008 |
| Priority date | — |
| Expiry date | Dec 1, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2001/1093
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention relates to a system and method for sampling a gas flow to measure one or more contaminants within a semiconductor processing tool. The system includes a portable unit containing one or more dry traps, Tenax traps and, if desired, wet impingers. The unit is coupled to a gas flow in a clean room and the dry traps. Tenax traps and wet impingers measure contaminants contained in the gas supply for a determined sampling interval. When the sampling interval is done, the unit is sent to an analysis facility for processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.