Method of manufacturing dichroic filter array
US7432026B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | May 10, 2006 |
| Grant date | Oct 7, 2008 |
| Priority date | — |
| Expiry date | Sep 20, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing a dichroic filter array is provided and comprises forming a first dichroic filter material layer on a substrate, and then forming a patterned photoresist layer on the first dichroic filter material layer. The exposed portion of the first dichroic filter material layer is removed so as to form a plurality of first dichroic filter units. A second dichroic filter material layer is formed on the substrate and the patterned photoresist layer. The patterned photoresist layer and the second dichroic filter material layer located on the patterned photoresist layer are removed, and the second dichroic filter material layer between the first dichroic filter units are transformed into a plurality of second dichroic filter units. By using etching process and the lift-off process to simultaneously remove redundant dichroic filter material and the photoreisit layer, the multi-chroic filter array device with a relatively small volume can be rapidly produced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.