Interferometer systems for measuring displacement and exposure systems using the same
US7433048B2 · kind B2 · utility
4Cited by
9References
46Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 1, 2005 |
| Grant date | Oct 7, 2008 |
| Priority date | — |
| Expiry date | Sep 28, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2290/45
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Interferometer systems for measuring displacement include a displacement interferometer. This interferometer includes a displacement converter responsive to a measuring beam of light. The displacement converter is configured to transform movement thereof in a direction orthogonal to the measuring beam of light into a change in path length between a reflective surface of the displacement converter and the measuring beam of light. The displacement converter may include a transmission grating and a displacement mirror or a reflecting grating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.