Dong Woon PARK
22Patents
4h-index
33Co-inventors
59Inventor score
Filing activity: Sep 1, 2005 → Apr 26, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8871104B2 | Method of forming pattern, reticle, and computer readable medium for storing program for forming pattern | Emerging Cross-Sectional Technologies | 16 | Active |
| US9631908B2 | Arrow | Mechanical Engineering; Lighting; Heating | 8 | Active |
| US7460210B2 | Auto focus system, auto focus method, and exposure apparatus using the same | Physics | 6 | Expired |
| US7433048B2 | Interferometer systems for measuring displacement and exposure systems using the same | Physics | 4 | Active |
| US7877723B2 | Method of arranging mask patterns and apparatus using the method | Physics | 3 | Active |
| US7954073B2 | Methods of arranging mask patterns responsive to assist feature contribution to image intensity and associated apparatus | Physics | 3 | Active |
| US7937676B2 | Method of arranging mask patterns and apparatus using the method | Physics | 1 | Active |
| US10643888B2 | Overlay marks, methods of forming the same, and methods of fabricating semiconductor devices using the same | Electricity | 1 | Active |
| US8341561B2 | Methods of arranging mask patterns and associated apparatus | Physics | 1 | Active |
| US9711395B2 | Overlay marks, methods of forming the same, and methods of fabricating semiconductor devices using the same | Electricity | 1 | Active |
| US12055378B2 | Thickness measuring device | Physics | 1 | Active |
| US12428730B2 | Apparatus for treating substrate | Electricity | 0 | Active |
| US11346659B2 | Device for measuring thickness of specimen and method for measuring thickness of specimen | Electricity | 0 | Active |
| US11829070B2 | Apparatus for treating a substrate | Performing Operations; Transporting | 0 | Active |
| US10588842B2 | Use of silicone fluids as insecticides | Emerging Cross-Sectional Technologies | 0 | Active |
| US10553438B2 | Semiconductor device and method for fabricating the same | Electricity | 0 | Active |
| US11150080B2 | Thickness measurement apparatus, thickness measurement method, and thickness measurement program | Physics | 0 | Active |
| US11486822B2 | Specimen inspection device and specimen inspection method | Physics | 0 | Active |
| US12331399B2 | Apparatus for smoothly exhausting the atmosphere in a processing space when rotating a substrate with liquid | Physics | 0 | Active |
| US11781981B2 | Specimen inspection apparatus and specimen inspection method | Physics | 0 | Active |
| US12198893B2 | Plasma process monitoring apparatus using terahertz waves and monitoring method thereof | Electricity | 0 | Active |
| US8691693B2 | Methods of manufacturing semiconductor device | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.