Exposure apparatus and exposure method
US7433050B2 · kind B2 · utility
3Cited by
3References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 4, 2006 |
| Grant date | Oct 7, 2008 |
| Priority date | — |
| Expiry date | Jan 3, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70833
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is an exposing apparatus which projects an image of a pattern by a projection optical system, comprising a measuring unit having a sensor which measures a positional relationship between the projection optical system and a member which is positioned in relation to the projection optical system, and a first support device which has a first soft structure and which supports the measuring unit in a hanging manner separately from the projection optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.