Micro-electro-mechanical structure having electrically insulated regions and manufacturing process thereof
US7437933B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 7, 2005 |
| Grant date | Oct 21, 2008 |
| Priority date | — |
| Expiry date | Jan 24, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01C19/5769
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Micro-electro-mechanical structure formed by a substrate of semiconductor material and a suspended mass extending above the substrate and separated therefrom by an air gap. An insulating region of a first electrically insulating material extends through the suspended mass and divides it into at least one first electrically insulated suspended region and one second electrically insulated suspended region. A plug element of a second electrically insulating material different from the first electrically insulating material is formed underneath the insulating region and constitutes a barrier between the insulating region and the air gap for preventing removal of the insulating region during fabrication, when an etching agent is used for removing a sacrificial layer and forming the air gap.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.