Method and apparatus for pressure and mix ratio control
US7437944B2 · kind B2 · utility
8Cited by
34References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2007 |
| Grant date | Oct 21, 2008 |
| Priority date | — |
| Expiry date | Mar 12, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05D16/2046
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
The present invention provides apparatus and method for controlling mix ratio of gas supplied to a processing chamber integrated with chamber pressure. In one embodiment, an integrated controller is used to adjust mix ratio and chamber pressure. In one embodiment, the mix ratio and chamber pressure may be adjusted using a flow sensor and a control valve disposed in each gas supply line. In one embodiment, the flow sensor used in each gas supply line is insensitive to upstream pressure perturbations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.