Apparatus using hybrid coupled plasma
US7442273B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 14, 2004 |
| Grant date | Oct 28, 2008 |
| Priority date | — |
| Expiry date | Oct 29, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A hybrid coupled plasma type apparatus includes: a chamber having a gas-injecting unit; an electrostatic chuck in the chamber; an insulating plate over the gas-injecting unit; a high frequency generator; an impedance matching circuit connected to the high frequency generator; first and second antennas connected to the impedance matching circuit in parallel, a power of the high frequency generator being supplied to the first and second antennas; an electrode of a plate shape connected to one of the first and second antennas in serial, the power of the high frequency generator being supplied to the electrode; and a power distributor between the high frequency generator and one of the first and second antennas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.