Tantalum and niobium compounds and their use for chemical vapour deposition (CVD)

US7442407B2 · kind B2 · utility

Assignee

• H.C. STARCK INC. · US

Inventors

• Knud Reuter · Krefeld, DE
• Jörg Sundermeyer · Marburg, DE
• Alexei Merkoulov · Glückstadt, DE
• Wolfgang Stolz · Marburg, DE
• Kerstin Volz · Steffenberg, DE
• Michael Pokoj · Reiskirchen, DE
• Thomas L. Ochs · Munich, DE

Key dates

• Filing date: Jul 7, 2006
• Grant date: Oct 28, 2008
• Expiry date: Apr 27, 2027

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/12528
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

Tantalum and niobium compounds having the general formula (I) and their use for the chemical vapour deposition process are described:wherein