Michael Pokoj
2Patents
2h-index
7Co-inventors
27Inventor score
Filing activity: Jul 7, 2006 → Jan 4, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7754908B2 | Tungsten and molybdenum compounds and their use for chemical vapour deposition (CVD) | Emerging Cross-Sectional Technologies | 8 | Active |
| US7442407B2 | Tantalum and niobium compounds and their use for chemical vapour deposition (CVD) | Emerging Cross-Sectional Technologies | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.