Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon

US7442486B2 · kind B2 · utility

Assignee

• EASTMAN KODAK COMPANY · US

Inventors

• Harald Baumann · Tuttlingen, DE
• Udo Dwars · Herzberg, DE
• Detlef Pietsch · Badenhausen, DE
• Michael Flugel · Osterode, DE

Key dates

• Filing date: Feb 20, 2004
• Grant date: Oct 28, 2008
• Expiry date: Jun 12, 2024

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/031
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Radiation-sensitive element comprising: (a) one or more types of monomers each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from the following classes of compounds: metallocenes; 1,3,5-triazine derivatives with one to three CX3 groups, wherein X represents chlorine or bromine; peroxides; hexaarylbiimidazoles; oxime ethers; oxime esters; N-aryl glycines and derivatives thereof; thiol compounds; N-aryl, S-aryl and O-aryl polycarboxylic acids with at least 2 carboxyl groups of which at least one is bonded to the N, S or O atom of the aryl unit; alkyltriarylborates; benzoin ethers; benzoin esters; trihalogenomethylarylsulfones; amines; N,N-dialkylaminobenzoic acid esters; aromatic sulfonyl halides; trihalogenomethylsulfones; imides; diazosulfonates; 9,10-dihydroanthracene derivatives; a-hydroxy and a-amino acetophenones; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inor…