Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists
US7442487B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 30, 2003 |
| Grant date | Oct 28, 2008 |
| Priority date | — |
| Expiry date | Dec 30, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0382
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A series structure of a chemically amplified negative tone photoresist that is not based on cross-linking chemistry is herein described. The photoresist may comprise: a first aromatic structure copolymerized with a cycloolefin, wherein the cycloolefin is functionalized with a di-ol. The photoresist may also include a photo acid generator (PAG). When at least a portion of the negative tone photoresist is exposed to light (EUV or UV radiation), the PAG releases an acid, which reacts with the functionalized di-ol to rearrange into a ketone or aldehyde. Then new ketone or aldehyde is less soluble in developer solution, resulting in a negative tone photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.