Stabilization of nitrogen-containing and oxygen-containing organosilanes using weakly basic ion-exchange resins
US7442822B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 1, 2006 |
| Grant date | Oct 28, 2008 |
| Priority date | — |
| Expiry date | Sep 1, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07F7/20
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A process to stabilize nitrogen-containing or oxygen-containing organosilane from acid catalyzed attack and retard the resulting decomposition is disclosed. Such organosilanes, and the nitrogen-containing organosilane in particular, with a least one Si—H or N—H group are susceptible to this type of product decomposition. Treatment with a weakly basic ion exchange media retards this decomposition by scavenging the anions or acids that are attacking the Si—H group. Dilute exposures to these anions can initiate significant decomposition and effect product stability and long-term shelf-life for semiconductor processing for the use of silicon oxide, silicon oxynitride and silicon nitride films.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.