Erosion resistance of EUV source electrodes
US7446329B2 · kind B2 · utility
3Cited by
8References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 7, 2003 |
| Grant date | Nov 4, 2008 |
| Priority date | — |
| Expiry date | Jan 23, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/001
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Erosion of material in an electrode in a plasma-produced extreme ultraviolet (EUV) light source may be reduced by treating the surface of the electrode. Grooves may be provided in the electrode surface to increase re-deposition of electrode material in the grooves. The electrode surface may be coated with a porous material to reduce erosion due to brittle destruction. The electrode surface may be coated with a pseudo-alloy to reduce erosion from surface waves caused by the plasma in molten material on the surface of the electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.