Apparatus for applying disparate etching solutions to interior and exterior surfaces
US7448397B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 30, 2006 |
| Grant date | Nov 11, 2008 |
| Priority date | — |
| Expiry date | Jul 13, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/905
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Described are methods, systems, and chemistries for cleaning various components of semiconductor process equipment. A method in accordance with one embodiment cleans articles with differently contaminated interior and exterior surfaces by using those articles to separate a cleaning vessel into separate chambers, one chamber for the interior surface and one for the exterior surface. Different chemistries are then applied to the differently contaminated surfaces. This embodiment reduces the required volume of etchant, and consequently saves the cost, treatment, and disposal of toxic chemicals. One embodiment further reduces the requisite etchant volume using one or more volume-displacement elements that displace some of the etchant volume.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.