Waveform generator for microdeposition control system
US7449070B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 31, 2002 |
| Grant date | Nov 11, 2008 |
| Priority date | — |
| Expiry date | Feb 20, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/1241
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A microdeposition system (20) and method includes a head with a plurality of nozzles (230). A controller (22) generates nozzle firing commands that selectively fire the nozzles to create a desired feature pattern. Configuration memory stores voltage waveform parameters that define a voltage waveform (280) for each of the nozzles. A digital to analog converter (DAC) sequencer communicates with the configuration memory and the controller and outputs a first voltage waveform for a first nozzle when a nozzle firing command for the first nozzle is received from the controller (22). A resistive ladder DAC receives the voltage waveforms from the DAC sequencer. An operational amplifier (opamp) communicates with the resistive ladder DAC and amplifies the voltage waveforms. The nozzles fire droplets when the voltage waveforms received from the opamp exceed a firing threshold of the nozzle (230).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.