Tin oxide-based sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use therein
US7452488B2 · kind B2 · utility
1Cited by
8References
9Claims
0Family size
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Inventors
Key dates
| Filing date | Oct 31, 2006 |
| Grant date | Nov 18, 2008 |
| Priority date | — |
| Expiry date | Oct 31, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24364
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The present invention is directed to a composition consisting essentially of:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.