Prabhat Kumar
61Patents
15h-index
71Co-inventors
87Inventor score
Filing activity: Nov 25, 1983 → Apr 14, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5242481A | Method of making powders and products of tantalum and niobium | Chemistry; Metallurgy | 74 | Expired |
| US5245514A | Extruded capacitor electrode and method of making the same | Performing Operations; Transporting | 51 | Expired |
| US6521173B2 | Low oxygen refractory metal powder for powder metallurgy | Performing Operations; Transporting | 50 | Expired |
| US5171379A | Tantalum base alloys | Chemistry; Metallurgy | 44 | Expired |
| US5580516A | Powders and products of tantalum, niobium and their alloys | Chemistry; Metallurgy | 42 | Expired |
| US6261337A | Low oxygen refractory metal powder for powder metallurgy | Performing Operations; Transporting | 39 | Expired |
| US9040409B2 | Methods of forming solar cells and solar cell modules | Emerging Cross-Sectional Technologies | 34 | Active |
| US9076860B1 | Residue removal from singulated die sidewall | Electricity | 31 | Active |
| US7910051B2 | Low-energy method for fabrication of large-area sputtering targets | Emerging Cross-Sectional Technologies | 30 | Active |
| US9130057B1 | Hybrid dicing process using a blade and laser | Performing Operations; Transporting | 29 | Active |
| US7651658B2 | Refractory metal and alloy refining by laser forming and melting | Chemistry; Metallurgy | 22 | Expired |
| US8197894B2 | Methods of forming sputtering targets | Electricity | 19 | Active |
| US8043655B2 | Low-energy method of manufacturing bulk metallic structures with submicron grain sizes | Emerging Cross-Sectional Technologies | 19 | Active |
| US4464206A | Wrought P/M processing for prealloyed powder | Performing Operations; Transporting | 16 | Expired |
| US9142459B1 | Wafer dicing using hybrid laser scribing and plasma etch approach with mask application by vacuum lamination | Electricity | 15 | Active |
| US7837929B2 | Methods of making molybdenum titanium sputtering plates and targets | Performing Operations; Transporting | 13 | Expired |
| US9580773B2 | Niobium based alloy that is resistant to aqueous corrosion | Chemistry; Metallurgy | 13 | Active |
| US8491959B2 | Methods of rejuvenating sputtering targets | Electricity | 11 | Active |
| US8883250B2 | Methods of rejuvenating sputtering targets | Electricity | 10 | Active |
| US8088232B2 | Molybdenum tubular sputtering targets with uniform grain size and texture | Performing Operations; Transporting | 9 | Active |
| US6912113B2 | Thin film capacitor using conductive polymers | Emerging Cross-Sectional Technologies | 9 | Expired |
| US6731495B2 | Thin film capacitor using conductive polymers | Emerging Cross-Sectional Technologies | 8 | Expired |
| US7794554B2 | Rejuvenation of refractory metal products | Emerging Cross-Sectional Technologies | 7 | Expired |
| US9601375B2 | UV-cure pre-treatment of carrier film for wafer dicing using hybrid laser scribing and plasma etch approach | Electricity | 7 | Active |
| US4561892A | Silicon-rich alloy coatings | Emerging Cross-Sectional Technologies | 6 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.