Optical element fabrication method, optical element, exposure apparatus, device fabrication method
US7455880B2 · kind B2 · utility
0Cited by
11References
11Claims
0Family size
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Key dates
| Filing date | Aug 29, 2005 |
| Grant date | Nov 25, 2008 |
| Priority date | — |
| Expiry date | Dec 3, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/32
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
There is to provide an optical element fabrication method including the steps of forming a thin film onto a substrate, and eliminating a color center produced in the forming step by giving energy to the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.