Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7459690B2 · kind B2 · utility
1Cited by
16References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 12, 2006 |
| Grant date | Dec 2, 2008 |
| Priority date | — |
| Expiry date | Aug 19, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation sensor for use with a lithographic apparatus is disclosed, the radiation sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting the secondary radiation emerging from said layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.