Patent · US Active

Method for an automatic optical measuring of an OPC structure

US7460962B2 · kind B2 · utility

0Cited by

5References

6Claims

0Family size

Assignee

MueTec Automatisierte Mikroskopie und Meßtechnik GmbH · DE

Inventors

Hans-Juergen Brueck · Bad Endbach, DE
Gerd Scheuring · Munich, DE

Key dates

Filing date	Mar 19, 2004
Grant date	Dec 2, 2008
Priority date	—
Expiry date	Jan 4, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/36
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention relates to a method for optical measurement of an OPC structure (306), having a pre-determined structure (302) on a photo-mask, in order to determine a measurement of the structure in at least one direction, whereby, firstly, a region (300) is determined on the photo-mask, which comprises the OPC structure (306) to be measured. The intensity of the determined region (300) is then scanned in a first direction and the region in which the intensity passes a threshold is determined for each scan. The maximum separation between an edge (308) of the structure (302) and an edge (312) of the corresponding OPC structure (306) is determined, based on the difference of the determined regions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.