Lithographic apparatus and device manufacturing method
US7468779B2 · kind B2 · utility
10Cited by
16References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 28, 2005 |
| Grant date | Dec 23, 2008 |
| Priority date | — |
| Expiry date | Sep 15, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.