Fabrication and use of polished silicon micro-mirrors
US7470622B2 · kind B2 · utility
1Cited by
2References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 17, 2005 |
| Grant date | Dec 30, 2008 |
| Priority date | — |
| Expiry date | Sep 3, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/0833
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of fabricating silicon micro-mirrors includes etching from opposite sides of a silicon wafer with a polished surface on at least one of the opposite sides, to form silicon bars each having a parallelogram-shaped cross-section and including a portion of the polished surface. At least one of the silicon bars is mounted on a mounting surface. The polished surface of the silicon bar may be used to reflect optical signals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.