Patent · US Active

Lithographic apparatus with patterning device position determination

US7471373B2 · kind B2 · utility

2Cited by

8References

23Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Petrus Rutgerus Bartray · Ysselsteyn, NL
Wilhelmus Josephus Box · Eksel, BE
Dominicus Jacobus Petrus Adrianus Franken · Veldhoven, NL
Bernardus Antonius Johannes Luttikhuis · Nuenen, NL
Engelbertus Antonius Fransiscus Van Der Pasch · Oirschot, NL
Marc Wilhelmus Maria Van Der Wijst · Veldhoven, NL
Marc Engels · Wijgmaal, BE

Key dates

Filing date	Jun 25, 2004
Grant date	Dec 30, 2008
Priority date	—
Expiry date	Jul 20, 2026

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70775
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.