Lithographic apparatus and method
US7473917B2 · kind B2 · utility
42Cited by
10References
30Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 16, 2006 |
| Grant date | Jan 6, 2009 |
| Priority date | — |
| Expiry date | Nov 16, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70916
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A lithographic apparatus is provided with a measurement apparatus constructed and arranged to use surface plasmon resonance to detect contamination of a surface within the lithographic apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.