Buried short location determination using voltage contrast inspection
US7474107B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 22, 2006 |
| Grant date | Jan 6, 2009 |
| Priority date | — |
| Expiry date | Sep 28, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/2632
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Structure and methods of determining the complete location of a buried short using voltage contrast inspection are disclosed. In one embodiment, a method includes providing a test structure having a PN junction thereunder; and using the PN junction to determine the location of the buried short using voltage contrast (VC) inspection. A test structure may include a plurality of test elements each having a PN junction thereunder, wherein a location of the buried short within the test structure can be determined using the PN junction and the VC inspection. The PN junction forces a change in illumination brightness of a test element including the buried short, thus allowing determination of the complete location of a buried short.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.