Nanometer-precision tip-to-substrate control and pattern registration for scanning-probe lithography
US7474410B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 11, 2007 |
| Grant date | Jan 6, 2009 |
| Priority date | — |
| Expiry date | Jun 1, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01Q80/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An interferometric-spatial-phase imaging (ISPI) system includes an alignment mechanism for obtaining continuous six-axis control of a scanning probe tip with respect to a coordinate system attached to a substrate. A gap detection mechanism measures tip height above a substrate and controls tip approach toward the substrate of one or more tips, as well as measures tip deflection during surface contact of the one or more tips. A plurality of complementary marks is provided for attachment to the one or more tips. A plurality of grating marks is provided to backdiffract a reflected beam from a flexible cantilever to detect high-frequency tip deflection in a compact configuration of a light source and a light detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.