Calibration of X-ray reflectometry system
US7474732B2 · kind B2 · utility
9Cited by
25References
108Claims
0Family size
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Key dates
| Filing date | Dec 1, 2004 |
| Grant date | Jan 6, 2009 |
| Priority date | — |
| Expiry date | Oct 10, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/201
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for inspection of a sample includes irradiating the sample with a beam of X-rays and measuring a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum. An assessment is made of an effect on the spectrum of a non-uniformity of the beam, and the spectrum is corrected responsively to the effect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.