Apparatus and process for sensing fluoro species in semiconductor processing systems
US7475588B2 · kind B2 · utility
454Cited by
82References
64Claims
0Family size
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Key dates
| Filing date | Feb 14, 2005 |
| Grant date | Jan 13, 2009 |
| Priority date | — |
| Expiry date | Mar 7, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/19
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.