Patent · US Expired

Method for producing cavities having optically transparent wall

US7479234B2 · kind B2 · utility

1Cited by
18References
2Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 4, 2002
Grant dateJan 20, 2009
Priority date
Expiry dateSep 4, 2022

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81C2201/014
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A method is proposed which will enable cavities having optically transparent walls to be produced simply and cost-effectively in a component by using standard methods of microsystems technology. For this purpose, a silicon region is first produced, which is surrounded on all sides by at least one optically transparent cladding layer. At least one opening is then produced in the cladding layer. Over this opening, the silicon surrounded by the cladding layer is dissolved out, forming a cavity within the cladding layer. In this context, the cladding layer acts as an etch barrier layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.