Patent · US Active

Method for heating a chemically amplified resist layer carried on a rotating substrate

US7479463B2 · kind B2 · utility

2Cited by

28References

10Claims

0Family size

Assignee

TOKYO ELECTRON LIMITED · JP

Inventors

John Kulp · Louisville, US
Michael A. Carcasi · Austin, US
Merritt Funk · Austin, US

Key dates

Filing date	Mar 9, 2007
Grant date	Jan 20, 2009
Priority date	—
Expiry date	Mar 14, 2027

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/67109
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Embodiments of an apparatus and methods for heating a substrate and a sacrificial layer are generally described herein. Other embodiments may be described and claimed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.