Partial pressure control system, flow rate control system and shower plate used for partial pressure control system
US7481240B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 9, 2004 |
| Grant date | Jan 27, 2009 |
| Priority date | — |
| Expiry date | Mar 17, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/8733
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A partial pressure control system 45 includes two valves 2 which are branched from an operation gas supply pipe 44 and which variably control operation gas, pressure sensors 3 which are respectively connected to the each valves 2 in series and which detect pressure of the operation gas, and a controller 25 which proportionally controls the operation of the valves 2 based on detection result of the pressure sensors 3, thereby relatively controlling pressures P1 and P2 of the two valves. With this configuration, it is possible to reduce wastefull consumption of the operation gas, and to enhance the responsivity with respect to change of setting and the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.