Patent · US Active

Mirror for use in a projection exposure apparatus

US7481543B1 · kind B1 · utility

6Cited by

6References

10Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Udo Dinger · Oberkochen, DE
Frank Eisert · Aalen, DE
Siegfried Stacklies · Aalen, DE
Martin Weiser · Sinsheim, DE
Guenther Seitz · Löwenstein, DE

Key dates

Filing date	Sep 18, 2006
Grant date	Jan 27, 2009
Priority date	—
Expiry date	Sep 18, 2026

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB24B51/00
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

A mirror for use in a projection exposure apparatus is described. The mirror has a main surface extending beyond an outline of an optical surface of the main surface. The optical surface has a roughness of less than 1 nm rms, and the outline of the optical surface includes a portion where the main surface extends beyond the optical surface by less than 0.2 mm. Manufacturing the mirror may involve polishing the optical surface in regions of the main surface extending beyond the optical surface and removing material of the substrate carrying a portion of the surface extending beyond the optical surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.