Quartz guard ring
US7482550B2 · kind B2 · utility
9Cited by
5References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 2, 2007 |
| Grant date | Jan 27, 2009 |
| Priority date | — |
| Expiry date | Feb 2, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32568
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper electrode, a backing member attachable to an upper surface of the upper electrode, and an outer ring. The outer ring surrounds an outer surface of the backing member and is located above the upper surface of the upper electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.