Exposure method, substrate stage, exposure apparatus, and device manufacturing method
US7483119B2 · kind B2 · utility
55Cited by
7References
102Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 9, 2005 |
| Grant date | Jan 27, 2009 |
| Priority date | — |
| Expiry date | Dec 9, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70716
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.