Asymmetrical SRAM device and method of manufacturing the same
US7486543B2 · kind B2 · utility
6Cited by
2References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 28, 2005 |
| Grant date | Feb 3, 2009 |
| Priority date | — |
| Expiry date | May 15, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S257/903
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
In an asymmetrical SRAM device, and a method of manufacturing the same, the asymmetrical SRAM device includes a semiconductor substrate on which a plurality of unit cell regions are defined, and a plurality of active regions formed in each of the unit cell regions of the semiconductor substrate, wherein the active regions of each unit cell region are a mirror image of active regions of an adjacent one of the plurality of unit cell regions with respect to a boundary line between the adjacent unit cell regions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.