Pressure sensor adjustment using backside mask
US7487681B1 · kind B1 · utility
12Cited by
4References
28Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 6, 2007 |
| Grant date | Feb 10, 2009 |
| Priority date | — |
| Expiry date | Aug 6, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01L9/0073
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and apparatus for an absolute or gauge pressure sensor having a backside cavity with a substantially vertical interior sidewall. The backside cavity is formed using a DRIE etch or other MEMS micro-machining technique. The backside cavity has an opening that is cross shaped, where the dimensions of the cross may be varied to adjust pressure sensor sensitivity. The cross may have one or more rounded corners to reduce peak stress, for example, the interior corners may be rounded. A sensing conductor may be routed over one or more corners including the interior corners to detect breakage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.