Method and software for conducting efficient lithography WPH / lost time analysis in semiconductor manufacturing
US7489982B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2006 |
| Grant date | Feb 10, 2009 |
| Priority date | — |
| Expiry date | Sep 15, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70525
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and a computer readable medium includes instructions for obtaining time data as programmed into processing recipes or as recorded when a wafer is processed and transferred during lithography operations. The data is parsed and saved into an MES database. A report server accesses the database responsive to a query made of the database. A query may specify one or more fabrication parameters. The specified fabrication parameter or parameters is fixed and a data display is provided that compares times for processing and transferring wafers in various lithography operations used in the production of the semiconductor device and bottlenecks in lithography operations are identified by the comparative data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.