WaferTech, LLC
56Patents
46Active
56Granted
52Portfolio score
Filing activity: Nov 25, 1998 → Aug 9, 2018 · 7 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6346986B1 | Non-intrusive pellicle height measurement system | Physics | 8 | Expired |
| US6365015B1 | Method for depositing high density plasma chemical vapor deposition oxide in high aspect ratio gaps | Electricity | 7 | Expired |
| US6129819A | Method for depositing high density plasma chemical vapor deposition oxide in high aspect ratio gaps | Electricity | 6 | Expired |
| US7489982B2 | Method and software for conducting efficient lithography WPH / lost time analysis in semiconductor manufacturing | Physics | 6 | Active |
| US8546250B2 | Method of fabricating vertical integrated semiconductor device with multiple continuous single crystal silicon layers vertically separated from one another | Electricity | 5 | Active |
| US6251795A | Method for depositing high density plasma chemical vapor deposition oxide with improved topography | Electricity | 5 | Expired |
| US7631286B2 | Automated metrology recipe generation | Physics | 4 | Active |
| US9280151B2 | Recipe management system and method | Emerging Cross-Sectional Technologies | 4 | Active |
| US8529136B2 | High temperature ball bearing | Emerging Cross-Sectional Technologies | 3 | Active |
| US8530327B2 | Nitride shallow trench isolation (STI) structures and methods for forming the same | Electricity | 3 | Active |
| US6207590A | Method for deposition of high stress silicon dioxide using silane based dual frequency PECVD process | Electricity | 3 | Expired |
| US6778285B1 | Automatic in situ pellicle height measurement system | Physics | 2 | Expired |
| US8743585B2 | Semiconductor device with one-time programmable memory cell including anti-fuse with metal/polycide gate | Physics | 2 | Active |
| US6942168B2 | Spray nozzle suitable for use in hot corrosive environments and method of use | Performing Operations; Transporting | 2 | Expired |
| US8508971B2 | Semiconductor device with one-time programmable memory cell including anti-fuse with metal/polycide gate | Physics | 2 | Active |
| US7142314B2 | Wafer stage position calibration method and system | Physics | 2 | Expired |
| US6669535B1 | Platform table for cleaning parts | Emerging Cross-Sectional Technologies | 2 | Expired |
| US8911552B2 | Use of acoustic waves for purging filters in semiconductor manufacturing equipment | Electricity | 2 | Active |
| US9064788B1 | Statistical method for monitoring manufacturing equipment and processing operations | Emerging Cross-Sectional Technologies | 1 | Active |
| US7572342B2 | Method and apparatus for cleaning semiconductor photolithography tools | Emerging Cross-Sectional Technologies | 1 | Active |
| US8841676B2 | Vertical integrated semiconductor device with multiple continuous single crystal silicon layers vertically separated from one another | Electricity | 1 | Active |
| US8389356B2 | Flash cell with floating gate transistors formed using spacer technology | Electricity | 1 | Active |
| US10128325B2 | Inductor structures for integrated circuits | Electricity | 1 | Active |
| US9480938B2 | Method for using acoustic waves for purging filters in semiconductor manufacturing equipment | Electricity | 1 | Active |
| US10056276B2 | Fluid monitoring system and method for semiconductor fabrication tools | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.