Semiconductor substrate and process for producing it
US7491966B2 · kind B2 · utility
1Cited by
1References
8Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 21, 2005 |
| Grant date | Feb 17, 2009 |
| Priority date | — |
| Expiry date | Jan 29, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/324
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A process for producing a semiconductor substrate comprising a carrier wafer and a layer of single-crystalline semiconductor material:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.